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シャロートレンチアイソレーション - Shallow trench isolation

Shallow Trench Isolation ( STI ) Chemical Mechanical Polishing ( CMP ) Process for Advanced Logic TechnologyJP2006516362A - 歪みシリコンプロセス用にシャロートレンチ絶縁体を形成するプロセス - Google PatentsFamilyShallow trench isolationUS7732336B2 - Shallow trench isolation process and structure with minimized strained silicon consumption - Google PatentsFamilyUS6737334B2 - Method of fabricating a shallow trench isolation structure - Google PatentsFamilyImágenes libres de regalías de Shallow trench isolation. 3. From the figure poly-Si shallow trench isolation (STI) is...US8592915B2 - Doped oxide for shallow trench isolation (STI) - Google PatentsFamilyUS20080258134A1 - Method for making a semiconductor device including shallow trench isolation (sti) regions with maskless superlattice deposition following sti formation and related structures - Google PatentsFamilyChemical Mechanical Planarization of TEOS SiO 2 for Shallow Trench Isolation Processes on an IPEC/Westech 372 Wafer PolUS20070048927A1 - Shallow trench isolation by atomic-level silicon reconstruction - Google PatentsFamilyUS6716691B1 - Self-aligned shallow trench isolation process having improved polysilicon gate thickness control - Google PatentsFamilyVin IC Design: CMOS Inverter (a) Vdd NMOS Vss PMOS Vout Shallow trench isolationUS6716691B1 - Self-aligned shallow trench isolation process having improved polysilicon gate thickness control - Google PatentsFamilyUS7462549B2 - Shallow trench isolation process and structure with minimized strained silicon consumption - Google PatentsFamilyChemical Mechanical Planarization of TEOS SiO 2 for Shallow Trench Isolation Processes on an IPEC/Westech 372 Wafer Pol【図解】半導体製造工程の流れIsolation Techniques – LOCOS & STIDevice Isolation TechniquesUS6541351B1 - Method for limiting divot formation in post shallow trench isolation processes - Google PatentsFamilyUS20050151222A1 - Shallow trench isolation process and structure with minimized strained silicon consumption - Google PatentsFamilyUS8673738B2 - Shallow trench isolation structures - Google PatentsFamily
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Shallow Trench Isolation ( STI ) Chemical Mechanical Polishing ( CMP ) Process for Advanced Logic Technology

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